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Content Provider | IEEE Xplore Digital Library |
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Author | Yong-Sung Kim Sang-Hyeon Lee Soo-Ho Shin Sung-Hee Han Ju-Yong Lee Jin-Woo Lee Jun Han Seung-Chul Yang Joon-Ho Sung Eun-Cheol Lee Bo-Young Song Dong-Jun Lee Dong-Il Bae Won-Suk Yang Yang-Keun Park Kyu-Hyun Lee Byung-Hyuk Roh Tae-Young Chung Kinam Kim Wonshik Lee |
Copyright Year | 2005 |
Description | Author affiliation: Adv. Technol. Dev., Samsung Electron. Co. Ltd., Gyunggi-Do (Yong-Sung Kim; Sang-Hyeon Lee; Soo-Ho Shin; Sung-Hee Han; Ju-Yong Lee; Jin-Woo Lee; Jun Han; Seung-Chul Yang; Joon-Ho Sung; Eun-Cheol Lee; Bo-Young Song; Dong-Jun Lee; Dong-Il Bae; Won-Suk Yang; Yang-Keun Park; Kyu-Hyun Lee; Byung-Hyuk Roh; Tae-Young Chung; Kinam Kim; Wonshik Lee) |
Abstract | We integrate FinFET DRAM in sub-60nm feature size. To avoid severe passing gate effects in FinFET cell array, we introduce a local damascene gate structure. Threshold voltage control of the ultra thin body transistors is successfully achieved by adopting $p^{+}$ boron in-situ doped poly-silicon gate on the FinFET cells. As a result, very stable and uniform operation of FinFET cells is realized. The local damascene FinFET with $p^{+}$ gate can become a highly feasible mainstream DRAM technology for sub-60nm low-power high-speed devices |
Starting Page | 315 |
Ending Page | 318 |
File Size | 671650 |
Page Count | 4 |
File Format | |
ISBN | 078039268X |
DOI | 10.1109/IEDM.2005.1609338 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2005-12-05 |
Publisher Place | USA |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Random access memory FinFETs Threshold voltage Doping Transistors Leakage current Etching Voltage control Boron Low voltage |
Content Type | Text |
Resource Type | Article |
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