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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Tsurumi, T. Ma, J. Li, J. Kakemoto, H. Tsukiori, D. Sakamaki, R. Wada, S. Akedo, J. |
| Copyright Year | 2007 |
| Description | Author affiliation: Tokyo Inst. of Technol., Tokyo (Tsurumi, T.; Ma, J.; Li, J.; Kakemoto, H.; Tsukiori, D.; Sakamaki, R.) |
| Abstract | Fabrication of ceramic thick films on Cu or other metal substrates is a key issue to realize the integration and the embedding of passive components in print wiring boards (PWB). The aerosol deposition (AD) process developed in AIST, Japan is the only technique to fabricate ceramics thick films at room temperature. Barium titanate films were successfully deposited on Cu substrate at room temperature for embedded capacitors. Dielectric permittivity of the film was less than 200 because particles of barium titanate were broken into small peaces in the deposition process. A heat treatment at 300degC improved the permittivity up to 240, giving rise to the capacitance density above 3 $nF/mm^{2}.$ Microwave dielectric films of $Ba_{4.2}Sm_{9.2}Til_{8}O_{54}$ were deposited on Cu substrate. A transparent film shows almost the same permittivity and $TC_{f}$ with bulk ceramics. $Al_{2}O_{3}$ films were deposited on Al for the application to high-power module substrates. This $AI_{2}O_{3}/AI$ substrates showed better durability in a heat-cycle test than conventional AIN/Al substrates used in high-power electronic circuits of hybrid-cars. |
| Starting Page | 464 |
| Ending Page | 465 |
| File Size | 2490000 |
| Page Count | 2 |
| File Format | |
| ISBN | 9781424413331 |
| ISSN | 10994734 |
| DOI | 10.1109/ISAF.2007.4393299 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2007-05-27 |
| Publisher Place | Japan |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Aerosols Ceramics Thick films Temperature Barium Dielectric substrates Permittivity Titanium compounds Artificial intelligence Circuit testing |
| Content Type | Text |
| Resource Type | Article |
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