NDLI: Study on diameter of nanopore with focus ion beam

Content Provider	IEEE Xplore Digital Library
Author	Yan Zhang Liping Liu Yang Xuan Quanjun Liu
Copyright Year	2010
Description	Author affiliation: State Key Laboratory of Bioelectronics, Southeast University, Nanjing, 210096, China (Yan Zhang; Liping Liu; Yang Xuan; Quanjun Liu)
Abstract	This paper studies the relation of nanopore diameter to film thickness and FIB action time with focus ion beam (FIB). First, the fabrication process for free-standing silicon nitride (Si3N4) films was introduced and got 300 nm and 200 nm thick film at last. Then, a series of pores with different diameters were milled on films under different FIB action time. Subsequently, the relation was analyzed. Conclusions: 1) Nanopore diameter was reduced with the decrease of action time till to tmin that was the minimum time for milling a pore. Simultaneously a pore with minimum diameter named dmin can be obtained. 2) The increase of action time caused nanopore expansion but the expansion rate decreased gradually. However, when the time increased to a certain value named tmax, the nanopore diameter didn't expand any more but tended to a stable diameter named dmax 3) With the action time increasing, the expansion rate decreased till to zero. 4) According to the data, we can easily know that the thicker film had less tmin and tmax value as well as slower expansion rate and vice versa.
Starting Page	1595
Ending Page	1598
File Size	326847
Page Count	4
File Format	PDF
ISBN	9781424464951
e-ISBN	9781424464982
DOI	10.1109/BMEI.2010.5639273
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-10-16
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Fabrication Atomic measurements free-standing silicon nitride film Films nanopore film thickness Milling Silicon Nanobioscience FIB action time Ion beams
Content Type	Text
Resource Type	Article

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