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Content Provider | IEEE Xplore Digital Library |
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Author | Zhu, R. Khemka, V. Bose, A. Roggenbauer, T. |
Copyright Year | 2006 |
Description | Author affiliation: Freescale Semicond., Inc., Tempe, AZ (Zhu, R.; Khemka, V.; Bose, A.; Roggenbauer, T.) |
Abstract | A novel drift region engineered stepped-drift LDMOSFET device in Freescale's 0.25mum smart power technology is reported for the first time. The specific on-resistance of the device is 0.33 $mOmegamiddotcm^{2}$ at breakdown voltage of 59 V, the best reported data to date. SOA of the device has been improved up to 87% compared to its conventional counterpart |
Starting Page | 1 |
Ending Page | 4 |
File Size | 3938512 |
Page Count | 4 |
File Format | |
ISBN | 0780397142 |
DOI | 10.1109/ISPSD.2006.1666139 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2006-06-04 |
Publisher Place | Italy |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Power engineering and energy Semiconductor optical amplifiers Isolation technology Immune system Geometry Cost function Power generation Process control Proximity effect Degradation |
Content Type | Text |
Resource Type | Article |
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