NDLI: Developing a dual-stage indirect virtual metrology architecture

Content Provider	IEEE Xplore Digital Library
Author	Wen-Huang Tsai Fan-Tien Cheng Wei-Ming Wu Tung-Ho Lin
Copyright Year	2010
Description	Author affiliation: Chung Shan Institute of Science and Technology, Taoyuan, Taiwan, R.O.C. (Tung-Ho Lin) \|\| Institute of Manufacturing Information and Systems, National Cheng Kung University, Tainan, Taiwan, R.O.C. (Wen-Huang Tsai; Fan-Tien Cheng; Wei-Ming Wu)
Abstract	Over the past few years, the virtual metrology (VM) technology has been proposed and developed and several VM related papers have been published. These proposed VM architectures are mainly applied for conjecturing single-stage or direct processing quality. However, the processing quality of some of manufacturing processes cannot be measured directly. Those single-stage VM architectures may not be applied to handle this indirect VM problem accurately. To properly handle this indirect VM problem, the paper proposes a dual-stage indirect VM architecture (DIVMA), which involves two process tools, to handle the indirect VM problem. In Stage I, the direct VM model of the fore-tool is established as usual, and then the indirect VM model of the rear-tool is built in Stage II that involves the Stage-I VM output. The concept of virtual cassette is also proposed in the paper. The chemical vapor deposition (CVD) process of a fifth generation TFT-LCD fab in Chi Mei Optoelectronics Corporation (CMO), Taiwan is adopted to test and compare the conjecture accuracy without and with the virtual cassette and the proposed DIVMA. Experimental results demonstrate that the virtual-cassette concept is valid for improving VM conjecturing accuracy; also this DIVMA is adequate for handling the indirect VM problem that has a coupling effect between those two subsequent tools.
Starting Page	2107
Ending Page	2112
File Size	493422
Page Count	6
File Format	PDF
ISBN	9781424450381
ISSN	10504729
DOI	10.1109/ROBOT.2010.5509719
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-05-03
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Metrology Virtual manufacturing Manufacturing processes Glass Chemical vapor deposition Semiconductor device manufacture Thin film transistors Robotics and automation USA Councils Manufacturing automation dual-stage indirect VM architecture (DIVMA) Virtual metrology (VM) virtual cassette indirect VM problem
Content Type	Text
Resource Type	Article
Subject	Artificial Intelligence Control and Systems Engineering Electrical and Electronic Engineering Software

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