NDLI: Photo-Resist Ashing Byatmospheric Pressure Plasma

Content Provider	IEEE Xplore Digital Library
Author	Han, K.H. Kang, J.G. Uhm, H.S. Kang, B.K.
Copyright Year	2005
Description	Author affiliation: Dept. of Molecular Sci. & Technol., Ajou Univ., Suwon (Han, K.H.; Kang, J.G.; Uhm, H.S.)
Abstract	Summary form only given. Atmospheric plasma has an advantage not to use vacuum equipments. Thus, many researchers are beginning to develop methods of plasma generation at the atmospheric pressure and to find various industrial applications of the atmospheric plasmas, which may replace vacuum plasmas. Photo-resist (PR) ashing process has been conducted in vacuum plasma. PR ashing has been conventionally done in wet ashing and dry ashing. But the wet ashing have many problems including high-cost, environmental pollution and so on. Therefore, the dry ashing is more preferable process. Unfortunately, the present dry ashing requires the vacuum equipments at the moment. This paper presents experimental results of the PR ashing using glow plasma at the atmospheric pressure. The plasma generation is powered by a RF power source. The PR ashing by the atmospheric pressure plasma was investigated under various processing conditions. The ashing rate has been investigated in terms of processing temperature, gas composition, gas flow rate, RF power and exposure time. We measured PR thickness using micro-area gauge (NanoSpec/AFT). The results of this study will be useful for the optimization of ashing process conditions at the atmospheric pressure.
Sponsorship	Plasma Sci. Appl. Comm. IEEE Nucl. Plasma Sci. Soc.
Starting Page	312
Ending Page	312
File Size	935539
Page Count	1
File Format	PDF
ISBN	0780393007
ISSN	07309244
DOI	10.1109/PLASMA.2005.359440
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Atmospheric-pressure plasmas Plasma applications Plasma temperature Plasma materials processing Plasma sources Plasma measurements Radio frequency Environmentally friendly manufacturing techniques Industrial pollution Power generation
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Tthe study of black matrix ashing of FPD industry by atmospheric pressure plasma technology

Comparative study of atmospheric pressure LF and RF micro jet plasmas produced in a single electrode system

Gas cleaning with semi-wet type plasma reactor

Laser initiation and radiofrequency sustainment of high pressure plasmas

Low-Temperature Cyclonic Plasma Created at Atmospheric Pressure

Generation of a low-power capacitively coupled plasma at atmospheric pressure

Ozone generation in an atmospheric pressure micro-plasma jet in air

Measurements of neutral depletion effects and techniques for initiating low pressure, high power helicon plasmas

Characterization of a Ferroelectric Atmospheric Pressure Plasma Source

Photo-Resist Ashing Byatmospheric Pressure Plasma

Similar Documents

Tthe study of black matrix ashing of FPD industry by atmospheric pressure plasma technology

Comparative study of atmospheric pressure LF and RF micro jet plasmas produced in a single electrode system

Gas cleaning with semi-wet type plasma reactor

Laser initiation and radiofrequency sustainment of high pressure plasmas

Low-Temperature Cyclonic Plasma Created at Atmospheric Pressure

Generation of a low-power capacitively coupled plasma at atmospheric pressure

Ozone generation in an atmospheric pressure micro-plasma jet in air

Measurements of neutral depletion effects and techniques for initiating low pressure, high power helicon plasmas

Characterization of a Ferroelectric Atmospheric Pressure Plasma Source

Photo-Resist Ashing Byatmospheric Pressure Plasma