NDLI: Destruction of Bacterial Communities using Gas Discharge Plasma.

Content Provider	IEEE Xplore Digital Library
Author	Bray, J. Joaquin, J.C. Brelles-Marino, G. Abramzon, N.
Copyright Year	2005
Description	Author affiliation: California State Polytech. Univ., Pomona, CA (Bray, J.; Joaquin, J.C.; Brelles-Marino, G.; Abramzon, N.)
Abstract	Summary form only given. Biofilms are microbial communities attached to an environmental surface and embedded in an extracellular glue-like matrix. Biofilms are involved in bacterial pathogenesis and attachment to surfaces such as pipes and medical devices. Microorganisms in biofilms show different properties compared to free-living cells; thus, conventional methods of killing bacteria are often ineffective with biofilms. Therefore, the ability to destroy these organisms is critical. The use of non-thermal plasmas potentially offers an effective alternative to conventional sterilization methods because plasmas contain a mixture of charged particles, chemically reactive species, and UV radiation and their decontamination potential relative to individual microorganisms is well established. However, to our knowledge, there is no information about the use of plasma to destroy bacterial biofilms. 4 and 7 day-old bacterial biofilms were produced using two bacterial species Rhizobium gallicum, Chromobaderium violaceum CV026 or a mixture of both bacteria. Gas discharge plasma was produced by using an AtomfloTM 250 reactor (Surfx Technologies, CA). An atmospheric pressure plasma was generated by using a He flow of 20.4 L/min and a secondary gas flow $(N_{2})$ of 0.305 L/min. Bacterial biofilms were exposed to plasma for different exposure times. Our results show that a 10-minute plasma treatment was able to kill 100% of the cells in most cases. Optical emission spectroscopy was used to study plasma composition and temperature which was then correlated with the effectiveness of killing. An emission spectrum from 200-450 nm will be presented. The characteristic features of the spectrum in the far ultraviolet are the NO gamma-bands near 250 nm and an OH band around 309 nm. The most prominent emission is due to the $N_{2}$ 2nd positive band. Using the $N_{2}$ emissions, a plasma rotational temperature of 325 K was obtained with a margin of uncertainty of 20 K
Sponsorship	Plasma Sci. Appl. Comm. IEEE Nucl. Plasma Sci. Soc.
Starting Page	154
Ending Page	154
File Size	1184958
Page Count	1
File Format	PDF
ISBN	0780393007
ISSN	07309244
DOI	10.1109/PLASMA.2005.359149
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Microorganisms Plasma temperature Plasma properties Atmospheric-pressure plasmas Plasma devices Plasma chemistry Surface discharges Extracellular Pathogens Organisms
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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