NDLI: DiPS: Diversified Plasma Simulator for Divertor, Space and Processing Plasma Simulation

Content Provider	IEEE Xplore Digital Library
Author	Woo, H.-J. Chung, K.-S. Choi, Y.-S. Lee, M.-J. Do, J.-J. Choi, G.-S. Seo, Y.-J.
Copyright Year	2005
Description	Author affiliation: Electr. Probe Applications Lab., Hanyang Univ., Seoul (Woo, H.-J.; Chung, K.-S.; Choi, Y.-S.; Lee, M.-J.; Do, J.-J.; Choi, G.-S.; Seo, Y.-J.)
Abstract	Summary form only given. DiPS (diversified plasma simulator), a new versatile linear machine (length=4000 mm, diameter=200-600 mm) is introduced for development of electric probe technology and its applications. As a unique feature for the diversified uses of sources and divertor simulator experiments, space and processing simulation chambers can be detached from and attached to the divertor simulation chamber by rail. To verify current theories and develop new theories of electric probes with magnetic field, collisionality, various particle source, and wide range of plasma parameters: $density=10^{6}-10$ $^{14}$ $cm^{-3},$ electron temperature=1-10 eV, magnetic field=0-2 kG, plasma types=RF and DC. To make a stable high density DC plasma, $LaB_{6}$ disk of 4 inches is used as thermal electron emission source. Heater of $LaB_{6}$ disk is made of graphite and the heating power is about 5 kW. Initial plasma density of the LaB6 source is $5times10^{12}$ $cm^{-3},$ electron temperature is 8-10 eV. Plasma size is about 40 mm at pressure of 1.6 mtorr in test region and 100 mtorr in source region, which can be expanded up to 100 mm in diameter with lower magnetic field. Helicon plasma source is also developed as a high density RF plasma source in DiPS, which generates the plasma with density of $2times10^{13}$ $cm^{-3}$ and electron temperature 3.5 eV for the RF power of 2.5 kW at optimum pressure of 7.5 mtorr. DiPS is to be utilized as simulators for fusion edge plasmas, space plasma and processing plasma
Sponsorship	Plasma Sci. Appl. Comm. IEEE Nucl. Plasma Sci. Soc.
Starting Page	199
Ending Page	199
File Size	1163059
Page Count	1
File Format	PDF
ISBN	0780393007
ISSN	07309244
DOI	10.1109/PLASMA.2005.359227
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasma simulation Plasma materials processing Plasma sources Plasma temperature Plasma density Space technology Magnetic fields Plasma stability Plasma applications Probes
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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