NDLI: Transparent metal electrodes

Content Provider	IEEE Xplore Digital Library
Author	Ghosh, D.S. Martinez, L. Pruneri, V.
Copyright Year	2009
Description	Author affiliation: ICFO, Mediterranean Technology Park, 08860 Castelldefels (Barcelona), Spain (Ghosh, D.S.; Martinez, L.; Pruneri, V.)
Abstract	A crucial challenge in the optoelectronics industry is the realization of cheap and reliable transparent electrodes, i.e. films that permit to bring electrical current or potentials in proximity of optically active regions without significant loss of optical energy. The state of the art solution lies in large band gap semiconductors heavily doped with metals, known as transparent conductive oxides (TCOs), including indium tin oxide (ITO) [1]. Metal films, when sufficiently thin (≪10 nm), become transparent to light, still maintaining continuity, thus having good electrical properties. We will show that, with respect to ITO, ultrathin metal films (UTMFs) can possess similar levels of transparency in the visible range, larger UV and IR transmittance and larger electrical conductivity [2, 3]. Figure 1 shows three-dimensional AFM image of Ni 10 nm film. RMS roughness and a peak-to-valley level were found to be 0.3 and 1.7 nm, respectively, both being well below deposited thickness. Figure 2 shows the transmission spectra of ultrathin Ni films of various thicknesses compared to 100 nm ITO film, confirming that electrodes made of ultrathin Ni films have wider spectrum of transparency compared to ITO. In particular their transparency is similar in the visible and larger in the UV and mid-IR ranges. Similar results have also been obtained with Cr.
Starting Page	1
Ending Page	1
File Size	429313
Page Count	1
File Format	PDF
ISBN	9781424440795
DOI	10.1109/CLEOE-EQEC.2009.5196451
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2009-06-14
Publisher Place	Germany
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Electrodes Electric potential Semiconductor films Semiconductor materials Photovoltaic cells Indium tin oxide Solar energy Metals industry Optical films Conducting materials
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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