NDLI: Ultrafast laser induced microexplosion: A new strategy to synthesise super-dense nanomaterials

Content Provider	IEEE Xplore Digital Library
Author	Juodkazis, S. Misawa, H. Gamaly, E.G. Rode, A.V.
Copyright Year	2009
Description	Author affiliation: Research Institute for Electronic Science, Hokkaido University, Sapporo, Japan (Juodkazis, S.; Misawa, H.) \|\| Laser Physics Centre, Research School of Physics and Engineering, Australian National University, Canberra ACT 0200, Australia (Gamaly, E.G.; Rode, A.V.)
Abstract	We demonstrate the ability to compress materials to high density/temperature using femtosecond laser pulses from a standard table-top laser tightly focused inside transparent dielectrics such as glass, quartz, or sapphire. Extremely high pressure (∼10 TPa) and temperature $(5×10^{5}K)$ have been produced using a single ∼200 fs laser pulse focused inside transparent dielectrics. The laser pulse of intensity over 0.1 $PW/cm^{2}$ converts a material within the absorption volume of ∼0.15 $mm^{3}$ into plasma in a few femtoseconds. A pressure of ∼10 TPa, far exceeding the strength of any material, builds up to the end of the pulse. The pressure generates strong shock and rarefaction waves. Finally, this results in the formation of a nano-void surrounded by a shell of shock-compressed material [1]. In sapphire, the size of the compressed shell revealed that it has a density 1.14 times of the initial sapphire density. The unique conditions, namely, the extreme pressure and temperature at record high heating and cooling rates become available in a well-controlled laboratory environment.
Starting Page	1
Ending Page	1
File Size	9822864
Page Count	1
File Format	PDF
ISBN	9781424440795
DOI	10.1109/CLEOE-EQEC.2009.5192211
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2009-06-14
Publisher Place	Germany
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasma materials processing Pulse compression methods Absorption Dielectric materials Glass Nanomaterials Optical materials Plasma temperature Optical pulses Plasma waves
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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