NDLI: Research and development on UV-LIGA at HUST

Content Provider	IEEE Xplore Digital Library
Author	Zhimou Xu Shaowei He Xong Li Shangbao Wang Xinjian Yi Kun Lian Sheng Liu
Copyright Year	2003
Description	Author affiliation: Inst. of Microsystems, Huazhong Univ. of Sci. & Technol., Wuhan, China (Zhimou Xu; Shaowei He; Xong Li; Shangbao Wang; Xinjian Yi; Kun Lian; Sheng Liu)
Abstract	UV-LIGA utilizes, instead of the X-ray an ultraviolet source to expose the resists. Such a source can be provided by mercury lamps. The mask involved is a simple chromium mask. These factors are decisive in making the UV-LIGA much cheaper than the LIGA fabrication. UV-LIGA fills the gap existing in fabrication technologies between the methods of classical mechanics and the technologies of microelectronics, offering completely new design and construction possibilities for sensors, actuators and microsystems, such as microfluidic systems. In addition, UV-LIGA technology has been extensively applied in the fields of Microelectromechanical System (MEMS). UV-LIGA technology has been studied for several years at Huazhong University of Science and Technology (HUST). In particular, the important development of UV-LIGA was obtained in the past two years. In this paper, the research and development on UV-LIGA technology at HUST will be described.
Sponsorship	Chinese Inst. of Electron
Starting Page	190
Ending Page	194
File Size	532145
Page Count	5
File Format	PDF
ISBN	0780381688
DOI	10.1109/EPTC.2003.1298723
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-10-28
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Research and development Fabrication Ultraviolet sources Resists Lamps Chromium Microelectronics Sensor systems Actuators Microfluidics
Content Type	Text
Resource Type	Article

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