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Content Provider | IEEE Xplore Digital Library |
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Author | Kato, T. Akahoshi, H. Nakamura, M. Hashimoto, T. Nishimura, A. |
Copyright Year | 2008 |
Description | Author affiliation: Mater. Res. Lab., Hitachi (Kato, T.) |
Abstract | A stress measurement method using SnCu coating on an Alloy 42 substrate sample, which indicated non-linear $sin^{2}$ Psi diagram for the coating under ordinary X-ray diffraction conditions was investigated. Diffraction profile versus 2thetas diagrams for peak indexes of (312), (501), (213), (600), (323), (541), and (631) obtained using an iso inclination method and a fixed Psi method using CuKalpha radiation showed clear peaks for some Psi angles. However, in other cases, the diagrams showed flat forms (no peaks). It was found that removing the Psi data with the flat forms from the diffraction profile versus 2thetas diagram gave a linear $sin^{2}Psi$ diagram for each index. Indexes with higher 2thetas degrees had a smaller confidence limit. The (631) peak with the highest 2thetas degree, which had no flat forms in the diffraction profile versus the 2thetas diagram, even with seventeen Psi data points, indicated a linear $sin^{2}thetas$ diagram and a confidence limit of less than plusmn2 MPa. |
Starting Page | 1491 |
Ending Page | 1497 |
File Size | 663931 |
Page Count | 7 |
File Format | |
ISBN | 9781424422302 |
ISSN | 05695503 |
DOI | 10.1109/ECTC.2008.4550173 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2008-05-27 |
Publisher Place | USA |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Stress measurement X-ray diffraction Coatings X-ray scattering Lead Copper alloys Substrates Scanning electron microscopy Production engineering Electronic mail |
Content Type | Text |
Resource Type | Article |
Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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