NDLI: Effective model-based mask fracturing for mask cost reduction

Content Provider	IEEE Xplore Digital Library
Author	Kagalwalla, A.A. Gupta, P.
Copyright Year	2015
Description	Author affiliation: EE Dept., Univ. of California, Los Angeles, Los Angeles, CA, USA (Kagalwalla, A.A.; Gupta, P.)
Abstract	The use of aggressive resolution enhancement techniques like multiple patterning and inverse lithography (ILT) has led to expensive photomasks. Growing mask write time has been a key reason for the cost increase. Moreover, due to scaling, e-beam proximity effects can no longer be ignored. Model-based mask fracturing has emerged as a useful technique to address these critical challenges by allowing overlapping shots and compensating for proximity effects during fracturing itself. However, it has been shown recently that heuristics for model-based mask fracturing can be suboptimal by more than 1.6× on average for ten real ILT shapes, highlighting the need for better heuristics. In this work, we propose a new model-based mask fracturing method that significantly outperforms all the previously reported heuristics. The number of e-beam shots of our method is 23% less than a state-of-the-art prototype version of capability within a commercial EDA tool for e-beam mask shot decomposition (PROTO-EDA) for ten ILT mask shapes. Moreover, our method has an average runtime of less than 1.4s per shape.
Starting Page	1
Ending Page	6
File Size	1131349
Page Count	6
File Format	PDF
ISBN	9781479980529
DOI	10.1145/2744769.2744828
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2015-06-08
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Association for Computing Machinery, Inc. (ACM)
Subject Keyword	EPON IEEE 802.3 Standard Pipelines Shape Benchmark testing MB-MDP Mask Fracturing Model-based E-beam Photomasks Semiconductor Manufacturing E-beam Proximity Effect Graph Coloring Lithography Rectilinear Covering Mask Data Prep VLSI DFM CAD EDA MDP
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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