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Content Provider | IEEE Xplore Digital Library |
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Author | Dawson-Elli, D.F. Fung, C.A. Nordman, J.E. |
Copyright Year | 1965 |
Abstract | A comparison was made between NbN thin films prepared with and without hollow cathode enhancement of DC reactive magnetron sputtering. The hollow cathode arc source is used in a triode configuration with the magnetron. This design allows sputtering to take place at pressures as low as 5*10/sup -4/ torr and has been shown to improve process control in the sputtering of oxides from metal targets. These films were investigated for application in NbN Josephson junctions. Film deposition parameters have been related to growth rate, stoichiometry as measured by Auger electron spectroscopy (AES), transition temperature, growth texture as measured by X-ray diffraction (XRD,), and ellipsometric parameters. The relationships were investigated using factorial experimental design. An important pressure-power interaction which leaves T/sub c/ nearly invariant was observed. This interaction is explained in terms of the counteracting effects of ion bombardment. The maximum T/sub c/'s achieved were 14.18 K and 14.75 K with and without the use of the hollow cathode, respectively. The data suggest that the effect of the hollow cathode is to increase ion bombardment of the substrate, at least when used with small magnetrons. |
Sponsorship | IEEE Magnetics Society |
Starting Page | 1592 |
Ending Page | 1595 |
Page Count | 4 |
File Size | 394146 |
File Format | |
ISSN | 00189464 |
Volume Number | 27 |
Issue Number | 2 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 1991-03-01 |
Publisher Place | U.S.A. |
Access Restriction | One Nation One Subscription (ONOS) |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Sputtering Cathodes Process control Josephson junctions Electrons Spectroscopy Temperature X-ray diffraction X-ray scattering Design for experiments |
Content Type | Text |
Resource Type | Article |
Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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