NDLI: Nanoscale laser writing of Indium-Tin-Oxide nanowires

Content Provider	IEEE Xplore Digital Library
Author	Afshar, M. Feili, D. Voellm, H. Straub, M. Koenig, K. Seidel, H.
Copyright Year	2012
Description	Author affiliation: Institute of Micromechanics, Microfluidics, and Microactuators, Faculty of Physics and Mechatronics, Saarland University, Saarbrücken, Germany (Afshar, M.; Feili, D.; Voellm, H.; Seidel, H.) \|\| Institute of Biophotonics and Laser Technology, Faculty of Physics and Mechatronics, Saarland University, Saarbrücken, Germany (Straub, M.; Koenig, K.)
Abstract	In this study we report on sub-wavelength nanostructuring of sputtered Indium-Tin-Oxide (ITO) films using a high-repetition rate near-infrared Ti:Sapphire laser system based on a 85 MHz, sub-10 fs resonator. Our experiments demonstrate that cuts as small as 20 nm in width can be generated by ablation. ITO nanowires ranging in size down to 50 nm were produced by laser writing at radiant exposure below the ablation threshold followed by etching in hydrochloric acid. The dependence of the minimum structure size on irradiation and material parameters as well as the electrical properties of the nanowires were investigated.
Starting Page	441
Ending Page	444
File Size	850005
Page Count	4
File Format	PDF
ISBN	9781467311229
e-ISBN	9781467311243
DOI	10.1109/NEMS.2012.6196813
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-03-05
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Ultrafast optics Nanowires Lasers Indium Optical imaging Ion beams nanowires sub-15 fs laser pulses sub-100 nm structures indium tin oxide self-organization surface ripples thin films
Content Type	Text
Resource Type	Article

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