NDLI: Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate

Content Provider	IEEE Xplore Digital Library
Author	Jhih-Nan Yan Yung-Chun Lee
Copyright Year	2012
Description	Author affiliation: National Cheng Kung University, TAIWAN (Jhih-Nan Yan) \|\| Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan (Yung-Chun Lee)
Abstract	This paper describes the fabrication processes of a new type of metal-embedded photo-mask, which will be used in standard photolithography and for fabricating patterned sapphire substrates. This new metal-embedded photo-mask is prepared by metal contact printing lithography and therefore can easily achieve smaller feature size around or below 1 µm. Besides its easiness in fabricating and obtaining smaller line-width, this new metal-embedded photo-mask differs from a conventional Cr/glass photo-mask in that the metallic patterns are embedded and therefore are not in contact with photo-resist during UV exposure. This unique feature can minimize the damage to photo-mask in use and prolong its lifetime. In this work, this metal-embedded photo-mask is experimentally prepared and applied to photolithographic patterning of PR microstructures on sapphire substrates, which are important in LED industries.
Starting Page	36
Ending Page	39
File Size	1404018
Page Count	4
File Format	PDF
ISBN	9781467311229
e-ISBN	9781467311243
DOI	10.1109/NEMS.2012.6196717
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-03-05
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Substrates Metals Stimulated emission Optical device fabrication Optical imaging Optical films Industries patterned sapphire substrates metal-embedded photo-mask
Content Type	Text
Resource Type	Article

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