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Content Provider | IEEE Xplore Digital Library |
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Author | Nakamura, K. Oya, D. Saito, S. Okabe, H. Hatade, K. |
Copyright Year | 2009 |
Description | Author affiliation: Power Device Works, Mitsubishi Electric Corporation, Fukuoka, 819-0192, Japan (Nakamura, K.; Oya, D.; Saito, S.; Hatade, K.) || Advanced Technology R&D Center, Mitsubishi Electric Corporation, Fukuoka, 819-0192, Japan (Okabe, H.) |
Abstract | In this paper, for the first time, 600 ∼ 6500 V IGBTs utilizing a new vertical structure of “Light Punch-Through (LPT) (II)” with Thin Wafer Process Technology demonstrate high total performance with low overall loss and high safety operating area (SOA) capability. This collector structure enables a wide position in the trade-off characteristics between on-state voltage (V(sat)) and turn-off loss (E) without utilizing any conventional carrier lifetime technique. In addition, this device concept achieves a wide operating junction temperature (@218 ∼ 423 K) of IGBT without the snap-back phenomena (≤298 K) and thermal destruction (≥398 K). From the viewpoint of the high performance of IGBT, the breaking limitation of any Si wafer size, the proposed LPT(II) concept that utilizes an FZ silicon wafer and Thin Wafer Technology is the most promising candidate as a vertical structure of IGBT for the any voltage class. |
Starting Page | 295 |
Ending Page | 298 |
File Size | 752223 |
Page Count | 4 |
File Format | |
ISBN | 9781424435258 |
ISSN | 1943653X |
DOI | 10.1109/ISPSD.2009.5158060 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2009-06-14 |
Publisher Place | Spain |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Insulated gate bipolar transistors Voltage Charge carrier lifetime Semiconductor optical amplifiers Diodes Research and development Performance loss Electrical safety Safety devices Temperature |
Content Type | Text |
Resource Type | Article |
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