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Content Provider | IEEE Xplore Digital Library |
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Author | Vobecki, J. Zahlava, V. Hemmann, K. Arnold, M. Rahimo, M. |
Copyright Year | 2009 |
Description | Author affiliation: Microelectronics Department, Czech Technical University in Prague, CZ-166 27 Prague 6, Czech Republic (Zahlava, V.) || ABB Switzerland Ltd, Semiconductors, Fabrikstrasse 3, CH - 5600 Lenzburg, Switzerland (Vobecki, J.; Hemmann, K.; Arnold, M.; Rahimo, M.) |
Abstract | In this paper, we introduce a fully functional high voltage (V= 4.5 kV) and high current (I= 7 kA) $p^{+}p^{−}n^{−}n^{+}$ diode based on Radiation Enhanced Diffusion (RED) technology. The RED-Diode employs a low-doped p-layer buried at ≈100 µm to increase the dynamic avalanche ruggedness for high SOA capability. The diode was processed on a 100 mm wafer and can safely turn off 4 and 7 kA @ 140°C @ 1500 A/µs for the diameters of 51 and 91 mm, resp. The RED of Pd was also extended from He to H irradiation. Compared to the reference diode without the buried p-layer, the RED diode has equal leakage, equal SOA capability under free-wheeling conditions, similar softness, 30% and 50% higher SOA for 51 and 91 mm diodes resp. with di/dt towards 10kA/µs. Clamp-less operation is presented up to 1300 A with peak power above 15 MW at 125 °C for the 91 mm diodes. For clamping diode application, this ruggedness can be further improved. |
Starting Page | 144 |
Ending Page | 147 |
File Size | 566985 |
Page Count | 4 |
File Format | |
ISBN | 9781424435258 |
ISSN | 1943653X |
DOI | 10.1109/ISPSD.2009.5158022 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2009-06-14 |
Publisher Place | Spain |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Semiconductor optical amplifiers Semiconductor diodes Helium Voltage Anodes Temperature Leakage current Doping profiles Electrons Annealing |
Content Type | Text |
Resource Type | Article |
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