NDLI: New mechanisms governing diffusion in silicon for transistor manufacture

Content Provider	IEEE Xplore Digital Library
Author	Seebauer, E.G.
Copyright Year	2004
Description	Author affiliation: Dept. of Chem. Eng., Illinois Univ., Urbana, IL, USA (Seebauer, E.G.)
Abstract	There is increasing evidence that nature of chemical bonding at surfaces or Si-SiO/sub 2/ interfaces can affect dopant activation and transient enhanced diffusion (TED) in the underlying silicon bulk during ultrashallow junction formation. There are two separate mechanisms for this influence: surface-bulk coupling by electrostatic repulsion and by intrinsic interstitial annihilation. For both mechanisms, the type of bonding at the surface or interface influences the rate at which interstitial atoms are annihilated there. Changing the effective annihilation probability changes the average concentration of interstitials in the underlying bulk, which in turn influences the degree of dopant activation and TED. The present work employs experiments with the optical technique of photoreflectance to quantify electrostatic coupling, and isotopic labeling experiments to quantity intrinsic interstitial annihilation. The resulting effects are investigated numerically using a simulator whose rate parameters have been developed from literature data using maximum likelihood (ML) estimation together with multivariate statistics to quantify accuracy. The resulting simulator yields excellent fits of SIMS profiles with no freely adjustable activation enemies.
Starting Page	1032
Ending Page	1037
File Size	1753667
Page Count	6
File Format	PDF
ISBN	078038511X
DOI	10.1109/ICSICT.2004.1436682
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2004-10-18
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Silicon Manufacturing Electrostatics Maximum likelihood estimation Chemicals Diffusion bonding Atom optics Optical coupling Labeling Numerical simulation
Content Type	Text
Resource Type	Article

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