NDLI: Noise-analyzing of piezoresistive silicon materials

Content Provider	IEEE Xplore Digital Library
Author	Xiaomei Yu Ting Li Dacheng Zhang
Copyright Year	2004
Description	Author affiliation: Inst. of Microelectron., Peking Univ., Beijing, China (Xiaomei Yu; Ting Li; Dacheng Zhang)
Abstract	A good cantilever should possess a small minimum detectable deflection (MDD), which depends on the measurement sensitivity and noise. Although increasing the measurement sensitivity can decrease the MDD of a cantilever, the noise will be a mainly limited factor when the measurement sensitivity is further increased. Therefore, the noise analyses of a piezoresistive cantilever are very important in improving cantilever resolutions. In this paper we analyze the noise characteristics of three silicon materials based on a large number of noise measurement results, which show that the 1/f noise is the dominant noise source at low frequencies and noise at high frequencies is Johnson noise. With the linear relation between 1/f noise and 1/L (piezoresistor length), Hooge factor /spl alpha/ of three materials was calculated. Optimized piezoresistor dimensions for a piezoresistive cantilever are given at last.
Starting Page	2194
Ending Page	2197
File Size	1015274
Page Count	4
File Format	PDF
ISBN	078038511X
DOI	10.1109/ICSICT.2004.1435279
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2004-10-18
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Piezoresistance Noise measurement Low-frequency noise Crystalline materials Amorphous silicon Chemical and biological sensors Biosensors Magnetic sensors Mechanical sensors Optical interferometry
Content Type	Text
Resource Type	Article

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