NDLI: Electromagnetic and mechanical analysis for micromachined filter

Content Provider	IEEE Xplore Digital Library
Author	Xiuping Li Jong-Gwan Yook Chun-Ying Dong Hong Wang Choi Look Law Aditya, S.
Copyright Year	2004
Description	Author affiliation: Dept. of Electr. & Electron., Yonsei Univ., Seoul, South Korea (Xiuping Li; Jong-Gwan Yook)
Abstract	This paper describes micromachined bandpass filters, design at K band, on GaAs and silicon substrates, respectively. The performance of a three-layer (supported by 2 /spl mu/m AlGaAs membrane) and two-layer (solid) filter structure on a GaAs substrate are compared and discussed. Electromagnetic simulation shows less than 1 dB insertion loss and acceptable stop band rejection for both the solid two-layer and membrane three-layer filter structure. A two-layer filter structure with a cavity on the bottom wafer is also proposed on a silicon substrate, where 10 /spl mu/m SiO/sub 2/ is used as a membrane. Both EM simulation results and mechanical analysis are provided. The boundary element method is used in mechanical simulation and a deflection of about 1.338 /spl mu/m is obtained for the SiO/sub 2/ membrane.
Starting Page	1735
Ending Page	1738
File Size	616496
Page Count	4
File Format	PDF
ISBN	078038511X
DOI	10.1109/ICSICT.2004.1435168
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2004-10-18
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Electromagnetic analysis Biomembranes Silicon Substrates Resonator filters Gallium arsenide Microwave filters Band pass filters Power transmission lines Dielectric losses
Content Type	Text
Resource Type	Article

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