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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Chen, F.F. Arnush, D. |
| Copyright Year | 1996 |
| Description | Author affiliation: Dept. of Civil Eng., California Univ., Los Angeles, CA, USA (Chen, F.F.) |
| Abstract | summary form given only, as follows. Analysis of experiments on helicon wave discharges have so far relied on a relatively simple formulation in which the electrons are assumed to be massless. Though this approximation is a good one at magnetic fields B above 100 G or so, it fails when applied to results at lower fields. Including the electron mass raises the governing equation to a fourth-order differential equation and gives rise to a new root, sometimes called the helicon-ECR mode, which is related to Trivelpiece-Gould modes. In general, the wave in the plasma is a mixture of the normal high-field helicon mode (Pi) and this low-field mode (/spl beta//sub 2/), and this mixture depends sensitively on the boundary conditions. In a plasma-filled conducting cylinder, the amplitude of /spl beta//sub 1/ is dominant at high magnetic fields; but /spl beta//sub 2/ becomes increasingly important as B is lowered, until for /spl omega//sub c/<2/spl omega/, it is the only mode possible. Since /spl beta//sub 2/ has short radial wavelength and is highly damped, it is effectively a surface wave. If the conducting boundary is separated from the plasma by a small gap, the two modes become decoupled and can have arbitrary amplitudes. If the conductor is moved to infinity while the plasma is confined by an insulator, the two modes are again coupled, but with a different ratio of amplitudes. This interesting behavior has not yet been verified in experiment but will affect the design of low-field helicon sources being developed for plasma processing. |
| File Size | 121759 |
| File Format | |
| ISBN | 0780333225 |
| ISSN | 07309244 |
| DOI | 10.1109/PLASMA.1996.551429 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1996-06-03 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Plasma waves Plasma confinement Electrons Magnetic fields Differential equations Plasma materials processing Plasma sources Magnetic analysis Boundary conditions Surface waves |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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