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Content Provider | IEEE Xplore Digital Library |
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Author | Niefeng Sun Xiawan Wu Youwen Zhao Nengjue Shen Xudong Chen Chaoguang Pu Keyun Bi Guangyao Yang Yongqiang Xu Kewu Yang Zhengping Zhao Tongnian Sun Weilian Guo Lanying Lin Liang Wang Quan Zhao Yan Huang Beling, C.D. Fung, S. |
Copyright Year | 2002 |
Description | Author affiliation: Hebei Semicond. Res. Inst., China (Niefeng Sun) |
Abstract | High purity InP is necessary for the preparation of high quality InP single crystal especially low Fe content semi-insulating and annealed undoped semi-insulating InP single crystal. In-situ phosphorus injection synthesis of InP has several advantages over the two-step process of compounding and growing in separate furnace. In 1982 it was reported by our group that around 500g InP was synthesized and semi-insulating InP single crystals grown in one step in 30-60 minutes. A large high pressure puller have been set up, which can be used to synthesize and grow large diameter InP single crystal in our laboratory. Now 3400g InP can be synthesized reproducible and single crystals can be grown in the puller. The red phosphorus used for synthesis is contained in two vessels, which can be manipulated separately during the synthesis process. The two phosphorus vessels are heated by the auxiliary heater and the phosphorus vapour is injected into the indium melt in the crucible. We have developed a process for the rapid synthesis of InP. The whole synthesis process only needs 60-70 minutes. The synthesized InP could be indium-rich, stoichiometric or phosphorus-rich which depend on the quantity of excess phosphorus and other conditions such as the temperature of indium melt in the crucible, the thermal field, phosphorus injection speed etc. After the synthesis, InP crystal can be pulled by the conventional LEC method. Twin-free 3-inch and 4-inch <100> InP single crystal can be obtained. The InP single crystal wafer is cut from the ingot for the measurement of electronic parameters. The carrier concentration of P-injection in-situ synthesis InP at T = 300 K is n = 2 /spl times/ 10/sup 15/ - 10/sup 16/ cm/sup -3/, the mobility is 3500 4900 cm/sup 2//Vs. These depend on the raw materials used. At T = 77 K the best result n = 2.36 /spl times/ 10/sup 15/ cm/sup -3/, the mobility is 4.8 /spl times/ 10/sup 4/ cm/sup 2//Vs. This kind of InP can be made semi-insulating with high temperature annealing or low iron doping levels. |
Sponsorship | IEEE Electron Devices Soc. IEEE Lasers & Electro-Opt. Soc |
Starting Page | 401 |
Ending Page | 404 |
File Size | 324478 |
Page Count | 4 |
File Format | |
ISBN | 0780373200 |
ISSN | 10928669 |
DOI | 10.1109/ICIPRM.2002.1014452 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2002-05-12 |
Publisher Place | Sweden |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Indium phosphide Iron Annealing Crystals Furnaces Laboratories Temperature dependence Rapid thermal processing Raw materials Doping |
Content Type | Text |
Resource Type | Article |
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