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Content Provider | IEEE Xplore Digital Library |
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Author | Yan, B.P. Hsu, C.C. Wang, X.Q. Bai, Y.K. Yang, E.S. |
Copyright Year | 2002 |
Description | Author affiliation: Dept. of Electr. & Electron. Eng., Hong Kong Univ., China (Yan, B.P.) |
Abstract | An InGaP/GaAsSb/GaAs double heterojunction bipolar transistor (DHBT) is presented. It features the use of a fully strained pseudomorphic GaAsSb (Sb composition: 10.4%) as the base layer and an InGaP layer as the emitter, which both eliminates the misfit dislocations and increases the valence band discontinuity at the InGaP/GaAsSb interface. A current gain of 200 has been obtained from the InGaP/GaAsSb/GaAs DHBT, which is the highest value obtained from GaAsSb base GaAs-based HBTs. The turn-on voltage of the device is typically 0.914 V for the 10.4% Sb composition, which is 0.176 V lower than that of traditional InGaP/GaAs HBT. The results show that GaAsSb is a suitable base material for reducing the turn-on voltage of GaAs HBTs. |
Sponsorship | IEEE Electron Devices Soc. IEEE Lasers & Electro-Opt. Soc |
Starting Page | 169 |
Ending Page | 172 |
File Size | 289586 |
Page Count | 4 |
File Format | |
ISBN | 0780373200 |
ISSN | 10928669 |
DOI | 10.1109/ICIPRM.2002.1014291 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2002-05-12 |
Publisher Place | Sweden |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Gallium arsenide Double heterojunction bipolar transistors Low voltage Heterojunction bipolar transistors Current density Power dissipation Conducting materials Photonic band gap Fabrication Radiative recombination |
Content Type | Text |
Resource Type | Article |
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