NDLI: Optical image enhancement effect in 35 nm isolated pattern replication using diamond x-ray phase shift mask

Content Provider	IEEE Xplore Digital Library
Author	Watanabe, H. Itoga, K. Kise, K. Yabe, H. Sumitani, H.
Copyright Year	2002
Description	Author affiliation: Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Hyogo, Japan (Watanabe, H.; Itoga, K.; Kise, K.; Yabe, H.; Sumitani, H.)
Abstract	Recently, technical driver for semiconductor devices is changed from DRAM to MPU, where smaller gate pattern is required. In x-ray lithography, Yang et al. have proposed an optical image enhancement technique, which enables the isolated pattern size in the x-ray mask to shrink until 1/5 times on a wafer. In this technique, /spl pi/ phase shift x-ray mask consisted of SiN was used. In this work, we propose /spl pi/ phase shift x-ray mask consisted of diamond and W. We have investigated on applicability of /spl pi/ phase shift x-ray mask for x-ray wavelength shorter than 7 /spl Aring/, and supposed that it is possible to reduce the shifter thickness resulting in /spl pi/ phase shift by the combination of diamond and W materials, because they have larger phase shift angles than SiN. We also discuss the pattern size variations for 35 nm isolated pattern with respect to phase shifter thickness and mask pattern size variations.
Sponsorship	Japan Soc. Appl. Phys. IEEE Electron Device Soc
Starting Page	66
Ending Page	67
File Size	117174
Page Count	2
File Format	PDF
ISBN	4891140313
DOI	10.1109/IMNC.2002.1178546
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2002-11-06
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Image enhancement X-ray imaging Phase shifters Resists Biomembranes Electromagnetic wave absorption Isolation technology Research and development Electronic mail Semiconductor devices
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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