NDLI: Absence of weak electron localization in ferromagnetic Co nanowires

Content Provider	IEEE Xplore Digital Library
Author	Brands, M. Carl, A. Dumpich, G.
Copyright Year	2005
Description	Author affiliation: Exp., Duisburg Univ., Germany (Brands, M.; Carl, A.; Dumpich, G.)
Abstract	Co nanowires are fabricated by standard electron beam lithography (EBL) and lift-off technique and by subsequent electron beam evaporation of Co. Some of the wires are covered with either Pt or C in order to prevent oxidation. Magentoresistance measurements are carried out in a He bath-cryostat with applied magnetic fields of up to B = 5.0 T in out-of-plane direction. Structural investigations reveal that the Co-wires have a polycrystalline morphology. Electron diffraction patterns indicate the predominance of hexagonal close packed (HCP) Co. Magnetic force microscopy (MFM) investigations show that all Co-wires are in a single-domain state at remanence with the magnetization lying in-plane along the long wire axis due to their strong shape anisotropy.
Sponsorship	Magnetics Soc. of Japan Magnetics Soc. of the IEEE
Starting Page	929
Ending Page	930
File Size	187308
Page Count	2
File Format	PDF
ISBN	0780390091
DOI	10.1109/INTMAG.2005.1463893
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-04-04
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Nanowires Electron beams Magnetic field measurement Magnetic force microscopy Lithography Wires Oxidation Helium Morphology Diffraction
Content Type	Text
Resource Type	Article

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