NDLI: Advanced process control applications for advanced CMP process

Content Provider	IEEE Xplore Digital Library
Author	Jun Yang Yi Shih Lin Yang, S.F. Yi Huang Qun Shao Hongtao Liu
Copyright Year	2015
Description	Author affiliation: Semicond. Manuf. Int. (Shanghai) Corp., Shanghai, China (Jun Yang; Yi Shih Lin; Yang, S.F.; Yi Huang; Qun Shao; Hongtao Liu)
Abstract	There are increasing new needs for advanced process control (APC) from chemical mechanical polishing (CMP) process along with the technology nodes advancing to 28nm and below. Besides traditional applications for wafer to wafer and batch to batch thickness variation reduction, and feed-forward based on incoming thickness/depth, the other new needs include within wafer uniformity control based on consumable counts and incoming profile, preventing polishing rate from dropping due to disk and pad deteriorating etc. This paper discusses those APC applications for CMP processes and along with important features which advanced APC software should equip with.
Starting Page	1
Ending Page	3
File Size	502288
Page Count	3
File Format	PDF
ISBN	9781479972418
ISSN	21582297
DOI	10.1109/CSTIC.2015.7153421
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2015-03-15
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Partition Process control Advanced process control Tuning Radio access networks Semiconductor device modeling Run to run control Profile control Production Software Safety guarding features Safety Chemical mechanical polishing
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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