NDLI: Run by run control of chemical-mechanical polishing

Content Provider	IEEE Xplore Digital Library
Author	Boning, D. Moyne, W. Smith, T. Moyne, J. Trelfeyan, R. Hurwitz, A. Sellman, S. Taylor, J.
Copyright Year	1995
Description	Author affiliation: Microsystems Technol. Lab., MIT, Cambridge, MA, USA (Boning, D.; Moyne, W.; Smith, T.)
Abstract	A prototype hardware/software system has been developed and applied to the control of single wafer chemical-mechanical polishing (CMP) processes. The control methodology consists of experimental design to build response surface and linearized control models of the process, and the use of feedback control to change recipe parameters (machine settings) on a lot by lot basis. Acceptable regression models were constructed for average removal rate and nonuniformity, which are calculated based on film thickness measurement at nine points on 8" blanket oxide wafers. For control, an exponentially weighted moving average model adaptation strategy was used, coupled to multivariate recipe generation incorporating user weights on the inputs and outputs, bounds on the input ranges, and discretization in the machine settings. We found that this strategy successfully compensated for substantial drift in the uncontrolled tool's removal rate. It was also found that the equipment model generated during the experimental design was surprisingly robust; the same model was effective across more than one CMP tool, and over a several month period.
Starting Page	81
Ending Page	87
File Size	880855
Page Count	7
File Format	PDF
ISBN	0780329961
DOI	10.1109/IEMT.1995.526097
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1995-10-02
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Semiconductor device modeling Linear feedback control systems Design for experiments Software prototyping Hardware Software systems Control systems Chemical processes Process control Response surface methodology
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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