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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Khorram, H.R. Fukui, J. Hagiwara, S. Mizoroke, S. Osanai, M. Onuki, T. Berghof, V. |
| Copyright Year | 2012 |
| Description | Author affiliation: Nikon Engineering Co. LTD Yokohama-city, Japan (Fukui, J.; Hagiwara, S.; Mizoroke, S.; Osanai, M.; Onuki, T.) || First Sensor AG, Peter - Behrens Strasse 15, Berlin, Germany (Berghof, V.) || Nikon Precision Inc. Belmont, USA (Khorram, H.R.) |
| Abstract | Similar to IC manufacturing, Cost of Ownership (CoO) and enhanced productivity are key focus areas for Microelectromechanical Systems (MEMS), Light Emitting Diodes (LED) and Air Bearing Surface (ABS) manufacturers. Here also, cost reduction can be achieved by incorporating more devices on a single wafer, increasing the wafer size, through yield improvements, as well as by reducing maintenance and operating costs. The lithography tools must provide sufficient resolution to satisfy imaging requirements, but it is imperative that they also deliver large depth of focus (DoF) and field-by-field focusing capabilities to achieve the desire CD fidelity. In addition to robust imaging and focusing capabilities the lithography tools must also provide sufficient overlay capabilities to overcome process challenges unique to MEMS/LED/ABS technologies. The scope of this work will be limited to the photolithography challenges associated with MEMS/LED/ABS manufacturing. |
| Starting Page | 315 |
| Ending Page | 320 |
| File Size | 4093726 |
| Page Count | 6 |
| File Format | |
| ISBN | 9781467303507 |
| ISSN | 10788743 |
| e-ISBN | 9781467303514 |
| DOI | 10.1109/ASMC.2012.6212919 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2012-05-15 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Micromechanical devices Lithography Light emitting diodes Substrates Approximation methods Resists DOF MEMS LED ABS IC LNA |
| Content Type | Text |
| Resource Type | Article |
| Subject | Industrial and Manufacturing Engineering Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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