NDLI: Scatterometry measurement for SiGe AEI sigma-shaped gate structures of 28nm technology

Content Provider	IEEE Xplore Digital Library
Author	Yu-Wen Wang Yeh, A. Pao-Chung Lin Chin-Cheng Chien Lin, C.-H.B. Xu, Z.-Q.J. Cheng, C.-Y.H. Sungchul Yoo Lin, J. Mihardja, L. Perry-Sullivan, C.
Copyright Year	2012
Description	Author affiliation: United Microelectronics Corporation, Tainan Science Park Tainan County 741, Taiwan, R.O.C. (Yu-Wen Wang; Yeh, A.; Pao-Chung Lin; Chin-Cheng Chien) \|\| KLA-Tencor, Corporation, 1 Technology Drive, Milpitas, CA 95035 U.S.A. (Lin, C.-H.B.; Xu, Z.-Q.J.; Cheng, C.-Y.H.; Sungchul Yoo; Lin, J.; Mihardja, L.; Perry-Sullivan, C.)
Abstract	Novel process control methodologies are required for SiGe gate recess structures that are used in IC manufacturing to enhance device performance. Metrology measurements of 28nm SiGe after-etch inspection U-sigma shaped and V-sigma shaped gate structures must be able to track subtle variations for several critical parameters, including SiGe-to-gate width, tip-to-gate width, sigma depth and recess depth. For production process control of these structures, a metrology tool must utilize a nondestructive measurement technique, and have high sensitivity, precision and throughput. This paper explores the capabilities of a new-generation scatterometry critical dimension (SCD) metrology tool to measure critical parameters and serve as a production process monitor for 28nm and beyond complex gate structures.
Starting Page	110
Ending Page	114
File Size	1064428
Page Count	5
File Format	PDF
ISBN	9781467303507
ISSN	10788743
e-ISBN	9781467303514
DOI	10.1109/ASMC.2012.6212879
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-05-15
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Logic gates Silicon germanium Radar measurements Correlation Metrology Shape measurement Process control metrology SiGe gate recess scatterometry critical dimension
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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