NDLI: Magnetostatic interactions between sub-micrometer patterned magnetic elements

Content Provider	IEEE Xplore Digital Library
Author	Janesky, J. Rizzo, N.D. Savtchenko, L. Engel, B. Slaughter, J.M. Tehrani, S.
Copyright Year	1965
Abstract	We have investigated the effect of the magnetostatic interaction field between submicrometer patterned magnetic elements in arrays (/spl sim/10/sup 8/ elements) using Alternating Gradient Force Magnetometry. Single layer NiFe elements were studied over a range of width (0.12 to 0.48 /spl mu/m), length to width aspect ratio (1.5 to 4) and thickness (30 /spl Aring/ to 60 /spl Aring/). The arrays were patterned using e-beam lithography in a rectangular lattice with bit separation equal to element width. Effective interaction fields were obtained using a novel application of /spl Delta/M plots to these patterned arrays. The /spl Delta/M plot is derived by subtracting remanent magnetization curves that had initial states of full magnetization from those that were initially demagnetized. Interaction fields were quantified using H/sub int/=/spl Delta/M//spl chi//sub irr/, where /spl Delta/M is the difference in these remanent loops and /spl chi//sub irr/ is the derivative of the remanent magnetization with respect to field. We found H/sub int/ to increase with element aspect ratio, thickness and inverse width. For structures with the largest aspect ratio, thickness and smallest width, H/sub int//spl ap/6 Oe. We calculated the actual dipolar interaction fields using micromagnetic simulation and used these fields in a simple 2-d Ising model to simulate the experiment. We found H/sub int/ that is a good measure of the difference in interaction fields tending to magnetize or demagnetize the sample.
Sponsorship	IEEE Magnetics Society
Starting Page	2052
Ending Page	2054
Page Count	3
File Size	59389
File Format	PDF
ISSN	00189464
Volume Number	37
Issue Number	4
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2001-07-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetostatics Magnetic separation Saturation magnetization Demagnetization Lithography Micromagnetics Magnetic field measurement Magnetic force microscopy Lattices Hard disks
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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