NDLI: Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted-annealed copper

Please wait, while we are loading the content...

Effect of manganese doping on optical and magnetic properties of titanium dioxide nanostructures prepared by hydrothermal technique in the presence of thiourea

Effect of pH on the structural and optical properties of nanostructured CdO films grown by chemical bath deposition technique

Effect of reference electrode in the nanoFET (field-effect transistor)-based biosensor experiment

Erratum: Use of ZnO nanorods grown atomic force microscope tip in the architecture of a piezoelectric nanogenerator

Evaluation of gas permeation through barrier layers for organic electronic devices by helium detector method

Fabrication of thermal-based vacuum gauge

Free-standing aluminium nanowire arrays for high-transmission plasmonic colour filters

Highly enhanced charge injection and bulk transport in organic gap-type diodes via one-pot treatment process: experiment and simulation

Hydrothermal synthesis of TiO2/reduced graphene oxide nanocomposite with enhanced photocatalytic activity

Implantable probe with split anchors via residual stress and induced cell growth with gelatin nanofibres

Increasing synthesis yield of K-doped tungsten oxide nanowire using stirred hydrothermal reactor and its near-infrared reflectance property

Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted-annealed copper

Investigation of anodic silicon dioxide thin films for microelectromechanical systems applications

Lyot-type flat-top fibre multiwavelength filter based on polarisation-diversity loop structure

Melittin based on silica nanoparticles for Agrobacterium tumefaciens inhibition

Microfluidic chip with interdigitated ultra-microelectrode array for total phosphorus detection

Numerical simulations for the rheological characteristics of emulsions under several conditions including temperature, shear rate, surfactant concentration and droplet size

Numerical simulations of light-extraction efficiencies of light-emitting diodes on micro and nanopatterned sapphire substrates

Numerous single-layer graphene sheets prepared from natural graphite by non-chemical liquid-phase exfoliation

Optimal design of organic–inorganic hybrid tandem solar cell based on a-Si:H and organic photovoltaics for high efficiency

Preparation and electrochemical behaviour study of layered Bi2SrTa2O9 with a cationic manganese porphyrin

Preparation of pitch-based carbon materials using a template and an orthogonal array design for super capacitors

Preparation of water-dispersible TiO2 nanoparticles

Structures and characteristics of delafossite CuCr1−x O2 thin films prepared by pulsed laser deposition

Tunable lens driven by dielectric elastomer actuator with ionic electrodes

Volume 9 (2014) : Issue 11, Nov

Volume 9 (2014) : Issue 10, Oct

Volume 9 (2014) : Issue 9, Sep

Volume 9 (2014) : Issue 8, Aug

Volume 9 (2014) : Issue 7, Jul

Volume 9 (2014) : Issue 6, Jun

Volume 9 (2014) : Issue 5, May

Volume 9 (2014) : Issue 4, Apr

Volume 9 (2014) : Issue 3, Mar

Volume 9 (2014) : Issue 2, Feb

Volume 9 (2014) : Issue 1, Jan

The Journal of Engineering

Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted-annealed copper

Content Provider	IET Digital Library
Author	Asl, Anousheh Kazemeini Larijani, Majdid M. Fathollahi, Vahid
Abstract	Cu thin films sputter-coated on single crystals of silicon were implanted with 30 keV nitrogen ions under various doses from 1.9 × 1017 to 5.7 × 1017 ions/cm2. The prepared samples were subsequently annealed in nitrogen atmosphere. The grazing incidence X-ray diffraction analysis revealed that in addition to the crystalline copper nitride phase, copper azides were developed by nitrogen ion implantation. With an increase of the implantation dose to 2.3 × 1018 ions/cm2, much of the Cu film was transformed to the crystalline Cu3N phase. Furthermore, the effect of nitrogen ion implantation on Cu thin films under various doses was investigated. The structural properties, morphology and sheet resistance of samples were investigated by grazing incidence X-ray diffraction, atomic force microscopy, field emission scanning electron microscopy and four-point probe techniques, respectively. In addition, the dependence of resistivity of the implanted samples on the implantation dose as well as structural properties is discussed.
Starting Page	917
Ending Page	921
Page Count	5
Volume Number	9
e-ISSN	17500443
Issue Number	Issue 12, Dec (2014)
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/mnl/9/12
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/10.1049/mnl.2014.0287
Journal	Micro & Nano Letters
Publisher Date	2014-12-16
Access Restriction	Open
Rights Holder	© The Institution of Engineering and Technology
Subject Keyword	Annealing Processes Atomic Force Microscopy Constant-composition Solid-solid Phase Transformations Copper Copper Azides Crystalline Copper Nitride Phase Cu:N Deposition by Sputtering Distribution Doping And Implantation of Impurities Doping Profiles Electrical Property of Metals And Metallic Alloys (thin Films/low-dimensional Structures) Electrical Resistivity Electron Volt Energy 30 KeV Epitaxy Field Emission Electron Microscopy Field Emission Scanning Electron Microscopy Four-point Probe Technique Gradients Grazing Incidence X-Ray Diffraction Heat And Thermomechanical Treatments Impurity Concentration Ion Dose Ion Implantation Metallic Thin Film NanoParticle Nanostructure Morphology Nanostructured Material Nanotube And Nanostructured Material Nitrogen Nitrogen Atmosphere Nitrogen Implanted-annealed Copper Nitrogen Ion Implantation Polymorphic, Massive, And Order-disorder Scanning Electron Microscopy Sheet Resistance Single Silicon Crystal Solid-solid Transitions Solid-state Phase Transformations Sputter Coating Sputter Deposition Structural Property Structure Structure of Solid Clusters Thin Film Thin Film Growth X-Ray Diffraction
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Nitrogen ion implantation and characterization of tungsten oxide films a.

Electron diffraction and high-resolution transmission microscopy studies of nanostructured si thin films deposited by radiofrequency dusty plasmas. Thin solid films (2002).

Impact of ion irradiation, elemental doping and coating cycles on structural characteristic parameters of nanocrystalline VO2 thin films

Influence of Substrate Bias Voltage on the Properties of Cu Thin Films by Sputter Type Ion Beam Deposition

Sputter deposition of metallic thin film and directpatterning

Morphological and optical properties of ultra-thin nanostructured Cu films deposited by RF sputtering on nanoporous anodic alumina substrate

Sputter Deposition of Nanostructured TiO₂ Thin Films

Surface Morphology of Annealed Lead Phthalocyanine Thin Films

Molecular dynamic simulation of binary zrxcu100-x metallic glass thin film growth (2013).

Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted-annealed copper

Similar Documents

Nitrogen ion implantation and characterization of tungsten oxide films a.

Electron diffraction and high-resolution transmission microscopy studies of nanostructured si thin films deposited by radiofrequency dusty plasmas. Thin solid films (2002).

Impact of ion irradiation, elemental doping and coating cycles on structural characteristic parameters of nanocrystalline VO2 thin films

Influence of Substrate Bias Voltage on the Properties of Cu Thin Films by Sputter Type Ion Beam Deposition

Sputter deposition of metallic thin film and directpatterning

Morphological and optical properties of ultra-thin nanostructured Cu films deposited by RF sputtering on nanoporous anodic alumina substrate

Sputter Deposition of Nanostructured TiO2 Thin Films

Surface Morphology of Annealed Lead Phthalocyanine Thin Films

Molecular dynamic simulation of binary zrxcu100-x metallic glass thin film growth (2013).

Influence of ion dose on nanostructure morphology and electrical properties of nitrogen implanted-annealed copper

Sputter Deposition of Nanostructured TiO₂ Thin Films