NDLI: Morphological and optical properties of ultra-thin nanostructured Cu films deposited by RF sputtering on nanoporous anodic alumina substrate

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The Journal of Engineering

Morphological and optical properties of ultra-thin nanostructured Cu films deposited by RF sputtering on nanoporous anodic alumina substrate

Content Provider	IET Digital Library
Author	Shaban, Mohamed Ahmed, Ashour M. Rahman, Ehab Abdel Hamdy, Hany
Abstract	Nanoporous materials have attracted considerable technological interest due to their wide range of applications. In this study, highly ordered nanoporous anodic alumina substrates (NAAS) were fabricated by two-steps anodisation. Radio-frequency (RF) magnetron sputtering was used to deposit ultrathin Cu layers of different morphologies on the top surface of NAAS. From the field emission-scanning electron microscope images, the Cu/NAAS morphologies were tuned from nanoporous ultra-thin Cu layer, to nanoporous-grains of Cu aggregates, then to a continues layer of Cu nanostones as the deposition time increased from 1 to 4 min. The reflection spectra of the Cu/NAAS samples were dominated with localised surface plasmon modes; longitudinal, transverse and higher-order modes. The surface plasmon resonances of the fundamental and higher-order longitudinal modes were shifted to longer wavelengths as the deposition time increased. In addition, the transverse surface plasmon resonances were shifted to longer wavelengths for deposition time ≤3 min (nanoporous Cu film) and suddenly shifted to shorter wavelengths for deposition time ≥4 min (continuous film). The correlations between the structural parameters and the shift of surface plasmon resonance modes were discussed. The strong red-shifted of the surface plasmon modes to the NIR region suggests a unique opportunity for the design of biomedical sensor based on the proposed structures.
Starting Page	295
Ending Page	298
Page Count	4
Volume Number	11
e-ISSN	17500443
Issue Number	Issue 6, Jun (2016)
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/mnl/11/6
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/10.1049/mnl.2015.0563
Journal	Micro & Nano Letters
Publisher Date	2016-06-01
Access Restriction	Open
Rights Holder	© The Institution of Engineering and Technology
Subject Keyword	Alumina Collective Excitations (surface States) Copper Cu-Al2O3 Deposition by Sputtering Deposition Time Epitaxy FESEM Field Emission Electron Microscopy Field Emission-scanning Electron Microscopy Localised Surface Plasmon Mode Nanofabrication NanoParticle Nanoporous Anodic Alumina Substrate Nanostructured Material Nanotube And Nanostructured Material Porous Material Reflection Spectroscopy RF Sputtering Sputter Deposition Structure Structure of Powder Structure of Solid Clusters Surface Plasmon Polariton Propagation Property Thin Film Thin Film Growth Time 1 Min to 4 Min Ultra-thin Nanostructured Cu Film
Content Type	Text
Resource Type	Article

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