NDLI: Electrochemical macroporous silicon etching with current compensation

Content Provider	IET Digital Library
Author	Hwang, Yongha Paydar, O. H. Ho, M. Rosenzweig, J. B. Candler, R. N.
Abstract	The depth-dependent changes of macroporous etching in aqueous hydrofluoric (HF) solutions are addressed. Macroporous etching of n-type silicon in HF acid produces high aspect ratio structures. However, an irregular etch profile can emerge as the pore depth increases, in particular branched regions emerging from vertical pores. The root cause of this non-ideal etch profile is investigated, focusing on the dark current component of electrochemical etching. The dark current during etch progression was simulated, and it was found that increased dark current resulted from increasing the interfacial contact between the electrolyte and silicon surface. A software-mediated photocurrent compensation method is developed that periodically samples the dark current component of the etch and adjusts the overall etch current, achieving stable pore formation.
Starting Page	1373
Ending Page	1375
Page Count	3
ISSN	00135194
Volume Number	50
e-ISSN	1350911X
Issue Number	Issue 19, Sep (2014)
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/el/50/19
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/10.1049/el.2014.1662
Journal	Electronics Letters
Publisher Date	2014-09-01
Access Restriction	Open
Rights Holder	© The Institution of Engineering and Technology
Subject Keyword	Aqueous Hydrofluoric Solutions Dark Conductivity Dark Current Component Electrochemical Analysis Electrochemical Analytical Method Electrochemical Macroporous Silicon Etching Electrochemistry And Electrophoresis Electrolyte Elemental Semiconductor Etching Interfacial Contact Photoconducting Material And Property Photoconduction And Photovoltaic Effect Photoconductivity Photodielectric Effect Semiconductor Technology Silicon Silicon Surface Software-mediated Photocurrent Compensation Method Surface Topography Measurement Surface Treatment And Coating Technique
Content Type	Text
Resource Type	Article
Subject	Electrical and Electronic Engineering

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