NDLI: Fabrication of thin-wall inverted pyramid hollow tips array and nano-aperture for maskless nanoscaled plasma patterning

Content Provider	IEEE Xplore Digital Library
Author	Jie Liu Li Wen Han Li Hai Wang Jinlan Peng
Copyright Year	2015
Description	Author affiliation: Dept. of Precision Machinery & Instrum., Univ. of Sci. & Technol. of China, Hefei, China (Jie Liu; Li Wen) \|\| Sch. of Mech. & Automotive Eng., Anhui Polytech. Univ., Wuhu, China (Han Li; Hai Wang) \|\| Center for Micro- & Nanoscale Res. & Fabrication, Univ. of Sci. & Technol. of China, Hefei, China (Jinlan Peng)
Abstract	This paper reports a new maskless nanoscale patterning method based on microdischarge devices tips array. That is, inverted pyramid microplasma devices are integrated into the scanning probe hollow tips array with nano-apertures. A 2×2 inverted pyramidal thin-wall hollow tips array with each microcavity dimension of 50μm microdischarge devices are successfully fabricated by MEMS process. Nano-apertures at the hollow tips are fabricated by Focused Ion Beam(FIB). Experimental results demonstrated that the inverted pyramid array and sidewall of the hollow tips array have a high surface quality. This work plays an important role for future application of microplasma nanoscaled maskless patterning.
Sponsorship	IEEE Nanotechnol. Council
Starting Page	498
Ending Page	501
File Size	658058
Page Count	4
File Format	PDF
ISBN	9781467366953
DOI	10.1109/NEMS.2015.7147477
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2015-04-07
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Arrays Plasmas Nanoscale devices Fabrication Microcavities Wet etching microplasma tips array nano-aperture nano-scaled maskless patterning
Content Type	Text
Resource Type	Article

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