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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Dars, P. Merckel, G. Haond, M. Coumar, O. Gaillard, R. Belhaddad, H. |
| Copyright Year | 1990 |
| Description | Author affiliation: CNET-CNS, Meylan, France (Dars, P.; Merckel, G.; Haond, M.) |
| Abstract | The authors discuss the influence of back oxide trapped charges on the degradation of the output characteristics of irradiated SOI PMOS transistors. It is found that a positive back gate bias during gamma irradiation promotes an accumulation of trapped holes at the Si-SiO/sub 2/ interface in the buried oxide. The induced parasitic kink effect, which is usually present in SOI NMOS, has been observed and characterized in a PMOS transistor. These results, explained by the increased electric field near the drain, are confirmed by a 2-D analysis. This phenomenon, related to P-channels, should be taken into account for analogical device and circuit optimization. |
| Starting Page | 97 |
| Ending Page | 98 |
| File Size | 134316 |
| Page Count | 2 |
| File Format | |
| ISBN | 0879425733 |
| DOI | 10.1109/SOSSOI.1990.145727 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1990-10-02 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | MOSFETs Silicon Semiconductor films Electric variables measurement Space charge Electric variables Gamma rays Degradation Substrates Plasma applications |
| Content Type | Text |
| Resource Type | Article |
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