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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Dongwook Suh Fossum, J.G. |
| Copyright Year | 1994 |
| Description | Author affiliation: Florida Univ., Gainesville, FL, USA (Dongwook Suh; Fossum, J.G.) |
| Abstract | The floating-body configuration is desirable in scaled SOI CMOS technology because of area efficacy. Unfortunately it portends various problems, one of which is the premature parasitic-BJT breakdown that occurs in both fully depleted (FD) and non-fully depleted (NFD) SOI MOSFETs. In the NFD device, other floating-body effects, some of which can be beneficial, are apparent at drain-source voltages below the breakdown because of the sensitivity of threshold voltage to the body-source bias. This bias, which can be forward or reverse in dynamic operation of the MOSFET, is due to positive or negative excess majority-carrier densities in the floating body. In this paper, we present a physical model for the NFD/SOI MOSFET and use it in a circuit simulator (SOISPICE) to identify and assess beneficial floating-body effects in dynamic operation of scaled CMOS digital circuits. |
| Starting Page | 67 |
| Ending Page | 68 |
| File Size | 190892 |
| Page Count | 2 |
| File Format | |
| ISBN | 0780324064 |
| DOI | 10.1109/SOI.1994.514238 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1994-10-03 |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Semiconductor device modeling MOSFETs Circuit simulation Electron devices Inverters CMOS technology Breakdown voltage Threshold voltage Electric breakdown |
| Content Type | Text |
| Resource Type | Article |
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