NDLI: Method for Evaluating Reliance Level of a Virtual Metrology System

Content Provider	IEEE Xplore Digital Library
Author	Fan-Tien Cheng Yeh-Tung Chen Yu-Chuan Su Deng-Lin Zeng
Copyright Year	2007
Description	Author affiliation: Inst. of Manuf. Eng., Nat. Cheng Kung Univ., Tainan (Fan-Tien Cheng; Yeh-Tung Chen)
Abstract	A method for evaluating reliance level of a virtual metrology system (VMS) is proposed. This method calculates a reliance index (RI) value between 0 and 1 by analyzing the process data of production equipment to decide if the virtual metrology result is reliable. A RI threshold is also defined in this method. If a RI value is higher than the threshold, the conjecture result is reliant; otherwise, the conjecture result needs to be further examined. In addition to the RI, the method also proposes process data similarity indices (SIs). The SIs are defined to evaluate the degree of similarity between the input set of process data and those historical sets of process data used to establish the conjecture model. Two kinds of SIs are included in the method: global similarity index (GSI) and individual similarity index (ISI). Both the GSI and ISI are applied to assist the RI in gauging the reliance level and locating the key parameter(s) that cause major deviation, hence the VMS manufacturability problem is resolved. An illustrative example with 300-mm semiconductor foundry production equipment in Taiwan is demonstrated in this work. The real experimental results show that this method is applicable to the VMS of (such as semiconductor and TFT-LCD) production equipment.
Sponsorship	IEEE Robotics and Automation Soc
Starting Page	1590
Ending Page	1596
File Size	819838
Page Count	7
File Format	PDF
ISBN	1424406013
ISSN	10504729
DOI	10.1109/ROBOT.2007.363551
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-04-10
Publisher Place	Italy
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Metrology Voice mail Production equipment Intersymbol interference Semiconductor device manufacture Manufacturing processes Materials testing System testing Foundries Semiconductor device testing manufacturability Reliance level reliance index (RI) degree of similarity global similarity index (GSI) individual similarity index (ISI) virtual metrology
Content Type	Text
Resource Type	Article
Subject	Artificial Intelligence Control and Systems Engineering Electrical and Electronic Engineering Software

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Evaluating Reliance Level of a Virtual Metrology System

Development of a Dual-Phase Virtual Metrology Scheme

Development of a Generic Virtual Metrology Framework

A virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing

Run-to-Run Control Utilizing Virtual Metrology With Reliance Index

Dual-Phase Virtual Metrology Scheme

A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing

Manufacturability of vacuum microtubes

Preliminary study of run-to-run control utilizing virtual metrology with reliance index

Method for Evaluating Reliance Level of a Virtual Metrology System

Similar Documents

Evaluating Reliance Level of a Virtual Metrology System

Development of a Dual-Phase Virtual Metrology Scheme

Development of a Generic Virtual Metrology Framework

A virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing

Run-to-Run Control Utilizing Virtual Metrology With Reliance Index

Dual-Phase Virtual Metrology Scheme

A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing

Manufacturability of vacuum microtubes

Preliminary study of run-to-run control utilizing virtual metrology with reliance index

Method for Evaluating Reliance Level of a Virtual Metrology System