NDLI: A virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing

Content Provider	IEEE Xplore Digital Library
Author	Tung-Ho Lin Ming-Hsiung Hung Rung-Chuan Lin Fan-Tien Cheng
Copyright Year	2006
Description	Author affiliation: Inst. of Manuf. Eng., Nat. Cheng Kung Univ., Tainan (Tung-Ho Lin)
Abstract	For maintaining high stability and production yield of production equipment in a semiconductor fab, on-line quality monitoring of wafers is required. In current practice, physical metrology is performed only on monitoring wafers that are periodically added in production equipment for processing with production wafers. Hence, equipment performance drift happening in-between the scheduled monitoring cannot be detected promptly. This may cause defects of production wafers and the production cost. In this paper, a novel virtual metrology scheme (VMS) that is based on a radial basis function neural network (RBFN) is proposed for overcoming this problem. The VMS is capable of predicting quality of production wafers using real-time sensor data from production equipment. Consequently, equipment performance abnormality or drift can be detected timely. Finally, the effectiveness of the proposed VMS is validated by tests on chemical vapor deposition (CVD) processes in practical semiconductor manufacturing. It is therefore proved that RBFN can be effectively used to construct prediction models for CVD processes
Sponsorship	IEEE Robotics and Autom. Soc
Starting Page	1054
Ending Page	1059
File Size	481812
Page Count	6
File Format	PDF
ISBN	0780395050
ISSN	10504729
DOI	10.1109/ROBOT.2006.1641849
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2006-05-15
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Metrology Semiconductor device manufacture Production equipment Voice mail Stability Job shop scheduling Costs Radial basis function networks Chemical sensors Semiconductor device testing
Content Type	Text
Resource Type	Article
Subject	Artificial Intelligence Control and Systems Engineering Electrical and Electronic Engineering Software

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing

Importance of Data Quality in Virtual Metrology

Modeling and scheduling for semiconductor wafer fabrication systems

Experiences with a control architecture for the virtual factory

Method for Evaluating Reliance Level of a Virtual Metrology System

Object-oriented hybrid PN model of semiconductor manufacturing line

Scheduling Semiconductor Lines Using A Fluid Network Model

Scheduling semiconductor device test operations

Scheduling Analysis of Cluster Tools with Buffer/Process Modules

A virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing

Similar Documents

A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing

Importance of Data Quality in Virtual Metrology

Modeling and scheduling for semiconductor wafer fabrication systems

Experiences with a control architecture for the virtual factory

Method for Evaluating Reliance Level of a Virtual Metrology System

Object-oriented hybrid PN model of semiconductor manufacturing line

Scheduling Semiconductor Lines Using A Fluid Network Model

Scheduling semiconductor device test operations

Scheduling Analysis of Cluster Tools with Buffer/Process Modules

A virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing