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| Content Provider | IEEE Xplore Digital Library | 
|---|---|
| Author | Jungmi Hong Yui Lun Wu Zihao Ouyang Cho, T.S. Ruzic, D.N. | 
| Copyright Year | 2011 | 
| Description | Author affiliation: Center for Plasma Material Interactions, University of Illinois at Urbana Champaign, 201 S. Goodwin Urbana, 61801, USA (Jungmi Hong; Yui Lun Wu; Zihao Ouyang; Cho, T.S.; Ruzic, D.N.) | 
| Abstract | The DBD (Dielectric Barrier Discharge) is well known for its great advantages in various kinds of industrial applications and has been widely used in manufacturing process including flat panel displays, thin films and semiconductor packaging. There has been enormous progress on DBD source development and diagnostics to suit these different purposes. At the same time, there are increasing needs for moderate and efficient remote plasma sources in order to avoid electrical damage from microarcs or high energy ion collisions. To this end, a stable remote plasma using an extended DBD source having a stable effective discharge area of 550mm × 40mm was investigated. The electron temperature was measured from a Boltzmann plot based a PLTE (Partial Local Thermodynamic Equilibrium) model and electron density measured from linewidth broadening of H line, with hydrogen insertion for comparison of the direct discharge region in between electrodes and the remote plasma region. The capacitance of DBD electrode as well as discharge energy and discharge power has been investigated with V-Q Lissajous analysis. Surface treatment of glass and polypropylene with various applied voltage and gas flow rates were studied. Combining optical and electrical diagnostics and surface analysis results on treated samples, the atmospheric plasma source for in-line processing was characterized. | 
| Starting Page | 1 | 
| Ending Page | 1 | 
| File Size | 32762 | 
| Page Count | 1 | 
| File Format | |
| ISBN | 9781612843308 | 
| ISSN | 07309244 | 
| e-ISBN | 9781612843292 | 
| e-ISBN | 9781612843285 | 
| DOI | 10.1109/PLASMA.2011.5993378 | 
| Language | English | 
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) | 
| Publisher Date | 2011-06-26 | 
| Publisher Place | USA | 
| Access Restriction | Subscribed | 
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) | 
| Subject Keyword | Fault location Discharges Plasmas Temperature measurement Electrodes Semiconductor device measurement | 
| Content Type | Text | 
| Resource Type | Article | 
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering | 
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