NDLI: Characterizations on a 2.45 GHz microwave induced atmospheric pressure plasma torch

Content Provider	IEEE Xplore Digital Library
Author	Ouyang, Z. Wu, Y.L. Surla, V. Cho, T.S. Ruzic, D.N.
Copyright Year	2011
Description	Author affiliation: Center for Plasma-Material Interactions, University of Illinois at Urbana-Champaign, 61801, USA (Ouyang, Z.; Wu, Y.L.; Surla, V.; Cho, T.S.; Ruzic, D.N.)
Abstract	The Center for Plasma-Material Interactions (CPMI) at the University of Illinois at Urbana-Champaign has developed a greater than 10 mm diameter 2.45 GHz microwave-induced atmospheric pressure plasma torch (APPT) for use in various manufacturing applications. The APPT has the ability to generate various atmospheric pressure plasmas (helium, argon, nitrogen) with a gas temperature range from room temperature (30°C) to more than 3,000 °C at the ignition area. The diagnostics of the electron temperature T, electron density n, and the plasma gas temperature T are based on the optical emission spectroscopy (OES) technique. The detailed dependence of the T, n and T on the microwave power, radial distance referred to the ignition point, gas type and gas flow rate will be presented individually. The validity of the OES technique, including the local thermal equilibrium conditions and the model for H calculation, has been verified and analyzed by the OES measured results. OES results has shown that T is in the range of 0.5–1.5 eV, n is in the range of $10^{14}-10^{16}$ $cm^{−3}$ and T is in the range of 900–3000 K by varying the power from 200–3000 W, depending on the type and the mixture ratio of the plasma gases. The spatial dependence of T, n and T has shown a drastic decrease in T but relatively slower changes in T and n. This provides possibility on both thermal and non-thermal operation conditions for applications of selectable material processes.
Starting Page	1
Ending Page	1
File Size	47914
Page Count	1
File Format	PDF
ISBN	9781612843308
ISSN	07309244
e-ISBN	9781612843292
e-ISBN	9781612843285
DOI	10.1109/PLASMA.2011.5993100
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2011-06-26
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Nitrogen Plasmas
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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