NDLI: 2.5 KJ KSU-dense plasma focus under high pressure regime

Content Provider	IEEE Xplore Digital Library
Author	Mohamed, A. E. Abdou, A. E. Ismail, M. I. Lee, S. Saw, S.H.
Copyright Year	2011
Description	Author affiliation: INTI International University, Nilai, 71800, Malaysia (Lee, S.; Saw, S.H.) \|\| Department of Mechanical and Nuclear Engineering, Kansas State University, Manhattan, 66506, USA (Mohamed, A. E.; Abdou, A. E.; Ismail, M. I.)
Abstract	It is experimentally confirmed in intermediate and low energy DPF that high pressure operation inhibits pinch formation and limits sheath acceleration down the axial tube. This technique is valuable in calculating the static impedance of the $machine^{1}.$ High pressure shots of more than 30 mbar were performed at KSU-DPF. The total average inductance L and resistance R has been calculated, including the capacitor bank and tube impedance. The data has been compared to the short circuit (SC) static parameters, and the error in L and R has been calculated. The test was performed using various gases over a wide range of molecular and/or atomic mass. It was found that the error in static inductance and resistance inversely proportional to gas molecular mass at certain pressure. The heavy gases like neon and argon were found to give the most accurate parameters with error less than 6% at 60 mbar. It was found also that increasing gas pressure over 30 mbar in heavy gases like Ar or Ne gives no effective improvement of the computed static impedance. Snowplow model with decaying current waveform was used to calculate the axial position and axial speed of the current sheet in the high pressure $regime^{2,3,4}.$ The average speed over the range of the used pressures was calculated; in heavy gases like argon it was found to be 0.79cm/µs, whereas in hydrogen was 1.6 cm/µs.
Starting Page	1
Ending Page	1
File Size	47684
Page Count	1
File Format	PDF
ISBN	9781612843308
ISSN	07309244
e-ISBN	9781612843292
e-ISBN	9781612843285
DOI	10.1109/PLASMA.2011.5993349
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2011-06-26
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Measurement units
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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