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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Hanlim Kang Dongjun Jin Junghyun Kim Hyunchul Kim Gyungsoon Park Guangsup Cho |
| Copyright Year | 2011 |
| Description | Author affiliation: Department of Electrophysics, Kwangwoon University, 447-1 Wallgye-Dong, Nowon-Gu, Seoul 139-701 Korea (Hanlim Kang; Dongjun Jin; Junghyun Kim; Hyunchul Kim; Gyungsoon Park; Guangsup Cho) |
| Abstract | The plasma jet devices have been studied widely for the biomedical applications. Plasma plume, generated from plasma jets, is able to be applied to human body or to be used for the surgical treatment and operation1. These applications are conducted through the reaction with the various kinds of particles as radicals and with the thermal effect of plasma itself. However, the influence of electric field or electric shock generated during a high voltage discharge is undesirable for the actual applications. In order to avoid the electric shock from the plasma device, the plasma of low current in the range of mA is used. Usually the plasma jet device generates the plasma plume with a positive voltage pulse rather than a negative voltage. When a positive pulse is applied to the electrode, the plasma itself has a positive potential considerably. The product of this positive potential and the plasma plume current has the electric power of plasma. This electric power might be proportional to the quantitative value of an electric shock to the human body. In this study, the zero potential of plasma plume is investigated with the double channel plasma jet device. |
| Starting Page | 1 |
| Ending Page | 1 |
| File Size | 58837 |
| Page Count | 1 |
| File Format | |
| ISBN | 9781612843308 |
| ISSN | 07309244 |
| e-ISBN | 9781612843292 |
| e-ISBN | 9781612843285 |
| DOI | 10.1109/PLASMA.2011.5993143 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2011-06-26 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Surgery Plasmas |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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