NDLI: Field emitter array cathodes for high current density, high current applications

Content Provider	IEEE Xplore Digital Library
Author	Schwoebel, P.R. Spindt, C.A. Holland, C.E.
Copyright Year	2004
Description	Author affiliation: Microsyst. Eng. Center, SRI Int., Menlo Park, CA, USA (Schwoebel, P.R.; Spindt, C.A.; Holland, C.E.)
Abstract	Summary form only given. Microfabricated field emitter array (FEA) cathodes have demonstrated the potential to provide kA/cm/sup 2/ current densities with long lifetimes in continuous or repetitively pulsed modes of operation. However, FEA cathodes have historically not achieved their full potential due to imperfect spatial uniformity of emission. For example, they have produced current densities of 2 kA/cm/sup 2/, but only over cathode areas of approximately 10/sup -4/ cm/sup 2/. On the other hand, areas of 10/sup -1/ cm/sup 2/ have reliably demonstrated current densities of only /spl sim/1 A/cm/sup 2/ due to, at least in part, less than ideal emission uniformity. We are addressing this issue with an in situ cathode processing technique that has been shown to both clean emitter tips and dramatically improve the spatial uniformity of emission. With additional effort the technique can likely be developed into a dependable process for achieving uniform emission between the tips of FEA cathodes and facilitate reliable FEA operation at high current densities and high total currents. To date we have used the processing technique to demonstrate an emission current of 300 mA from a 50,000-tip array covering an area of 7.8/spl times/10/sup -3/ cm/sup 2/. This corresponds to a current density of 38 A/cm/sup 2/. To our knowledge, such a total emission current from single FEAs has never been reported. We believe that with continued process development these arrays will achieve total currents of 1 A at current densities exceeding 100 A/cm/sup 2/. This talk will summarize the results of our cathode processing studies and discuss possible avenues of future research to enhance FEA performance.
Sponsorship	Plasma Sci. and Applications Committee of the IEEE Nuclear and Plasma Sci. Soc
File Size	81634
File Format	PDF
ISBN	0780383346
ISSN	07309244
DOI	10.1109/PLASMA.2004.1340212
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2004-07-01
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Field emitter arrays Cathodes Current density
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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