NDLI: Research on application of ion implantation at SWIP

Content Provider	IEEE Xplore Digital Library
Author	Wei Pu
Copyright Year	1997
Description	Author affiliation: Southwestern Inst. of Phys., Sichuan, China (Wei Pu)
Abstract	Summary form only given, as follows. In the last ten years, the research on application of ion implantation modification at SWIP in China has encompassed work in the areas of ion implantation equipment manufacture, material surface modification and its industrial applications including plasma source ion implantation (PSII) and ion beam ion implantation (IBII) technologies. Implantation equipment with the function of implantation and enhanced-deposition have been constructed. The MEVVA ion source for metal ion implantation and vacuum arc plasma source for metal plasma ion implantation and deposition have been employed successfully in IBII and PSII equipments respectively. Material surface modifications have been carried out in different modes. The modified workpieces have been tested in some industrial fields.
File Size	105106
File Format	PDF
ISBN	0780339908
ISSN	07309244
DOI	10.1109/PLASMA.1997.604894
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1997-05-19
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Ion implantation Plasma sources Manufacturing industries Ion beams Ion sources Vacuum arcs Plasma applications Plasma immersion ion implantation Plasma materials processing Testing
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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