NDLI: Increasing the magnetisation of electrolessly deposited Ni-B nanotubes

Content Provider	IEEE Xplore Digital Library
Author	Richardson, D. Rhen, F.M.
Copyright Year	2015
Description	Author affiliation: Phys. & Energy, Univ. of Limerick, Limerick, Ireland (Richardson, D.; Rhen, F.M.)
Abstract	Magnetic nanotubes have a wide variety of potential applications in modern technologies in areas such as energy conversion, electronic devices and high density memory storage [1]. Recently using electroless deposition, we have established a method to prepare continuous nanotubes 20 μm in length with external diameter of 400 nm and uniform wall thickness of 100 nm [2]. The electroless process requires the use of a reducing agent, which favors the incorporation of an alloying element. In this study, we use dimethylamineborane (DMAB) as a reducing agent, resulting in the co-deposition of Ni and B, thereby forming Ni-B alloys [3]. As the deposits contain boron, the specific magnetization is lower compared to pure Ni. Here, we investigate the dependence of magnetic properties of Ni-B nanotubes on deposition bath pH and annealing temperature. We show that the specific magnetization of Ni-B nanotubes increases after annealing due to crystallization of amorphous nanotubes, while the nanotube structure is still preserved at high temperatures. Our results are analyzed in comparison to bulk Ni metal with specific magnetization of 55.4 $JT^{-1}Kg^{-1}.$
Starting Page	1
Ending Page	1
File Size	517235
Page Count	1
File Format	PDF
e-ISBN	9781479973224
DOI	10.1109/INTMAG.2015.7157063
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2015-05-11
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Nanotubes Magnetization Annealing Nickel Boron Magnetic hysteresis
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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