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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Lu, Wenjie Kim, Jin K. Klem, John F. Hawkins, Samuel D. del Alamo, Jesus A. |
| Copyright Year | 2015 |
| Description | Author affiliation: Sandia National Laboratories, Albuquerque, NM, USA (Kim, Jin K.; Klem, John F.; Hawkins, Samuel D.) || Microsystems Technology Laboratories, MIT, 60 Vassar St., Rm. 39-567A, Cambridge, MA 02139, USA (Lu, Wenjie; del Alamo, Jesus A.) |
| Abstract | We demonstrate the first InGaSb p-channel FinFET. Towards this goal, we have developed a fin dry-etch technology which yields fins as narrow as 15 nm with vertical sidewalls, an aspect ratio greater than 10 and low sidewall interface state density. We have also realized Si-compatible ohmic contacts with ultra-low contact resistivity of 3.5–10−8 Q-cm2. InGaSb FinFETs with fin widths down to 30 nm and gate lengths down to 100 nm have been fabricated. The Al2O3 gate oxide has an EOT of 1.8 nm. A high gm of 122 μS/μm is obtained in devices of Wf = 100 nm and Lg = 100 nm. In the smallest devices with Wf = 30 nm and Lg = 100 nm, a gm of 78 μS/μm is achieved. |
| File Size | 2408235 |
| File Format | |
| ISSN | 2156017X |
| e-ISBN | 9781467398947 |
| DOI | 10.1109/IEDM.2015.7409810 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2015-12-07 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | FinFETs Logic gates Ohmic contacts Laboratories Conductivity Lithography |
| Content Type | Text |
| Resource Type | Article |
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