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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Ago, Hiroki Ogawa, Yui Kawahara, Kenji Ito, Yoshito Hu, Baoshan Orofeo, Carlo M. Fernandez, Pablo Soils Endo, Hiroko Hibino, Hiroki Mizuno, Seigi Tsukagoshi, Kazuhito Tsuji, Masaharu |
| Copyright Year | 2015 |
| Description | Author affiliation: Institute for Materials Chemistry and Engineering (IMCE), Kyushu University, Japan (Ago, Hiroki; Kawahara, Kenji; Hu, Baoshan; Fernandez, Pablo Soils; Endo, Hiroko) || Graduate School of Engineering Sciences, Kyushu University, Japan (Ogawa, Yui; Ito, Yoshito; Orofeo, Carlo M.; Mizuno, Seigi) || National Institute for Materials Science (NIMS), Japan (Tsukagoshi, Kazuhito) || Research and Education Center of Carbon Resources, Kyushu University, Japan (Tsuji, Masaharu) || Kwansei Gakuin University, Japan (Hibino, Hiroki) |
| Abstract | We demonstrate a novel epitaxial CVD method to grow high quality single-layer graphene using a thin Cu(111) film instead of conventional Cu foil. The atomically smooth Cu(111) catalyst produced the graphene with less defects and controlled orientation of the hexagonal lattice. The CVD graphene showed the carrier mobility as high as 20,000 cm2/Vs at room temperature. Using the uniform graphene sheet, densely aligned graphene nanoribbons were produced by a metal-assisted etching technique, resulting a high on/off ratio of 5,000. In addition, the epitaxial CVD method was applied to grow uniform double-layer graphene with more than 90% coverage. These GNRs and double-layer graphene are expected as promising candidates for semiconductor devices. Furthermore, heterostructures of MoS2 and graphene were developed, and unique photo-responsive devices were observed. |
| File Size | 1894094 |
| File Format | |
| ISSN | 2156017X |
| e-ISBN | 9781467398947 |
| DOI | 10.1109/IEDM.2015.7409779 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2015-12-07 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Graphene Epitaxial growth Etching Substrates Logic gates Optical films |
| Content Type | Text |
| Resource Type | Article |
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