NDLI: Process monitoring using advanced inspection methodologies

Content Provider	IEEE Xplore Digital Library
Author	Gaan, S. Zhiguo Sun Sipeng Gu Lee, Y.B. Palamadai, C. Li, J. Lingyan Zhao Fan, L.
Copyright Year	2014
Description	Author affiliation: KLA-Tencor Corp., Malta, NY, USA (Palamadai, C.; Li, J.; Lingyan Zhao; Fan, L.) \|\| Adv. Module Eng., GLOBALFOUNDRIES, Malta, NY, USA (Gaan, S.; Zhiguo Sun; Sipeng Gu; Lee, Y.B.)
Abstract	Defect free film deposition is one of the most challenging steps in CMOS manufacturing for 28nm process node and beyond. For precise control over surface, excellent uniformity and accurate material characteristics are required. IC manufacturers find it critical to monitor the film deposition process in terms of layer uniformity and other signatures/defects induced on the surface during the deposition process. In this work, an oxide layer deposited using flowable chemical vapor deposition (FCVD) process on a 300mm bare silicon wafer has been studied. Different process conditions with varying amount of precursor and reactant gases have been employed for the deposition of the oxide. The so called “haze” signatures and statistics found during inspection on the post-deposition surfaces are used to measure variation in surface quality, serving as a means to qualify the FCVD process. For this study, an FCVD tool fitted with two chambers with two sides each has been employed for the deposition of oxide. The integrated SURFmonitor feature of KLA-Tencor's SP3 - a blanket wafer defect inspection tool set - was successfully utilized to highlight the variation of the CVD tool's performance. Firstly, the overall study clearly demonstrates the capability of SURFmonitor to differentiate the process conditions between Process - 1 and Process -2. Also, for a given process, it showcases the capability of differentiating between different deposition chambers. In addition, for a given process and specific chamber, grid analysis feature of SURFmonitor has been applied to highlight the within-spec and the out-of-spec areas for each of the wafers. The methodology described in this paper has already proven to be quite effective in monitoring the CVD process.
Sponsorship	IEEE Electron Dev. Soc.
Starting Page	408
Ending Page	411
File Size	471542
Page Count	4
File Format	PDF
ISBN	9781479939442
DOI	10.1109/ASMC.2014.6846965
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-05-19
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Surface treatment Films Monitoring Inspection Plasmas Rough surfaces Surface roughness haze defect inspection flowable CVD SURFimage
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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