NDLI: People productivity improvement via cloud machine monitor

Content Provider	IEEE Xplore Digital Library
Author	Chen, Y.H. Huang, C.J. Wang, C.L.
Copyright Year	2014
Description	Author affiliation: Manuf. Dept., Taiwan Semicond. Manuf. Co. Ltd., Hsinchu, Taiwan (Chen, Y.H.; Huang, C.J.; Wang, C.L.)
Abstract	To maintain high stability and production yield of production equipment in a semiconductor fab, on-line quality monitoring of wafers is required. In current practice, physical metrology is performed only on monitor wafers that are periodically added in production equipment for processing with production wafers. In addition to control wafers usage and loss of tool availability, however, routine monitoring does result in a huge cost of manual operation loading. This is equivalent to about 15% loss of people productivity. To give consideration to quality control and people productivity improvement, the system of Cloud Monitor (CM) is proposed based on stepwise regression and principle component analysis (PCA). The CM is verified by test-runs on the chemical vapor deposition (CVD) and chemical mechanical polishing (CMP) processes. Eight monitor items are considered. The CM is effective to construct forecast models with 1.34% mean absolute prediction errors (MAPE) and 100% OOC catch rate (OCR). The experimental results indicate that the CM is capable of predicting quality of production wafers using real-time sensor data from production equipment. Its performance abnormality or drift can be detected timely as well as improving people productivity.
Sponsorship	IEEE Electron Dev. Soc.
Starting Page	205
Ending Page	207
File Size	342276
Page Count	3
File Format	PDF
ISBN	9781479939442
DOI	10.1109/ASMC.2014.6846998
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-05-19
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Monitoring Metrology Productivity Manufacturing Production equipment Semiconductor device modeling virtual monitor People productivity improvement monitor reduction cloud monitor virtual metrology
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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